Blog | (Nano) Metrology Systems takes the next step towards industrial 3D metrology
NXTGEN Semicon 4, the (nano) Metrology Systems project, is in a phase where the contours of the technological impact are becoming increasingly clear. Where the project started with defining joint research questions around 3D nanoscale imaging, the focus is now visibly shifting to validation, integration and applicability in an industrial context. Within the consortium, with Technolution as project leader and technology innovator, together with DELMIC, Nearfield Instruments, ARCNL, the Advanced Research Center for Nanolithography, and TU Delft, intensive work is being done on refining measurement principles that enable 3D insight at the nanoscale without destructive sample preparation.
From concept to measurement strategy
The past period has been dominated by combining different measurement modalities and deepening the physical understanding behind the signals that are measured. This may seem fundamental, but it is crucial for industrial reliability. A 3D measurement technique is only valuable if the interpretation of the data is reproducible and model-based.
This is where the power of collaboration comes to the fore. While ARCNL and TU Delft are working on modelling and validation of light-matter interactions at the nanoscale, DELMIC and Nearfield Instruments are translating these insights into instrumental architectures that are scalable for application in the semiconductor chain, but also in life sciences and pharma. Technolution plays a connecting role in this by integrating these developments at the system level, with a focus on data acquisition, real-time control and information extraction.
In concrete terms, this means that progress is being made in:
improving the signal-to-noise ratio in nanoscale measurements
linking 3D datasets to process parameters
Developing measurement concepts that are suitable for a higher throughput
Practical relevance is growing
The relevance of this work is becoming more and more tangible. New transistor architectures and advanced 3D structures require metrology that can see below the surface, without damaging wafers. The ability to reliably characterize internal structures has a direct impact on yield, development speed and failure costs.
By explicitly focusing on non-destructive 3D measurement technology in Semicon 4, solutions are being worked on that not only function in the lab, but also offer the prospect of integration in industrial environments.
Embedding in the research landscape
The FAST-EM early adopter tools are now actively used within the NWO 3DNI project. The collaboration between the NXTGEN High-tech partners and 3DNI ensures valuable cross-pollination between technological development and fundamental research. In this interaction, 3DNI builds on partial results from NXTGEN Hightech Semicon 4, while insights from fundamental research contribute to the further development of the technology.
What is striking in this phase of the project is the intensive interaction between PhD students, postdocs and engineers. The short lines of communication within the consortium ensure that theoretical insights are quickly tested in experimental setups and that practical questions flow directly back to the fundamental research.
Looking ahead: focus on scaling up and robustness
The project results have now led to new features and prototypes that are in the field. This shows that the developed technology not only offers perspective, but also actually finds its way into practical applications. At the same time, it is becoming increasingly clear that the use of (nano)metrology systems is not limited to the semiconductor industry. Applications are also emerging within life sciences and pharma in which these types of measurement systems can be of great value. The (nano) Metrology Systems project is thus moving emphatically from exploration to concretization. The foundation has been laid, the collaboration is solid and the first technological results underline the potential.
Led by Technolution, this project shows that the Netherlands is able to effectively connect fundamental knowledge, high-tech instrumentation and industrial relevance. The ambition remains clear: not only to make 3D insight at the nanoscale possible, but also to make it practically usable.