ARCNL pioneering sensor technologies and data processing in Semicon04
ARCNL performs fundamental research, focusing on the physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. While the academic setting and research style are geared towards establishing scientific excellence, the topics in ARCNL’s research program are intimately connected with the interests of the industrial partner ASML.
ARCNL anticipates significant advancements in its research capabilities and practical applications through the NXTGEN Hightech initiative. This project supports the mission-driven research approach, where applications drive innovation from the outset. Collaborating with partners like ASML, ARCNL aims to transition from lower TRL levels to impactful industrial applications, particularly in measuring complex conductivity parameters.
Project background:
(nano) Metrology systems
This project is dedicated to developing advanced metrology systems to accelerate and enhance high-tech processes such as the fabrication of integrated circuits and precision diagnostics of biological tissues. It focuses on integrating systems for parallel data acquisition, which necessitates the processing and storage of large data streams. The project aims to automate and optimize workflows in laboratories and production environments to increase effi ciency. Key areas include the development of faster and more accurate metrology systems, creating optimized workflows, and improving data analysis techniques to derive actionable insights from complex datasets. In doing so, NXTGEN Hightech brings together 5 expert partners over the next seven years.
Role in Semicon04
ARCNL leads Work Package 2 (WP 2) “Sensor Technologies” and participates actively in Work Package 4 (WP 4) “Data Processing” within the NXTGEN Hightech initiative. Their dual role encompasses developing machine learning (ML) based computational imaging techniques for metrology applications and exploring novel techniques for sub-micrometer optical imaging and spectroscopy using terahertz (THz) frequencies.
Primary objectives
Machine Learning for Metrology: pioneering ML-based approaches to enhance imaging performance and accuracy of high-throughput metrology tools. High-throughput metrology often results in lower quality imaging data, a challenge ARCNL aims to overcome with advanced computational frameworks.
THz Microscopy and Spectroscopy: This lower TRL sub-project investigates the use of terahertz frequencies for optical metrology of 2D and 3D materials. This innovative approach can measure the complex conductivity of materials without physical contact, potentially revolutionizing quality control in industrial applications.
ARCNL thrives on active knowledge exchange, open discussions, and fostering new collaborations. The organisation values constructive criticism and support, especially in larger volume data processing and scanning strategies. This collaborative environment is essential for driving innovation and achieving breakthrough results.
Completed activities
Development of a fast non-iterative algorithm for compressive image reconstruction through a multimode fiber.
Publication of a research paper in Optics Express journal based on these results.
Planned activities:
Development of a computational framework for simulation based inference (SBI) for overlay metrology.
Hiring of a PhD student for the THz microscopy project and installation of a new laser for generating THz light. First light is expected soon after the laser becomes operational.
ARCNL's unique expertise
ARCNL’s strength lies in its mission-driven research, with a clear focus on application-oriented outcomes. Their experience with ASML as a main funding partner underscores the capability to conduct highimpact research that addresses real-world challenges. By starting at lower TRL levels and working towards industrial applications, ARCNL aim to deliver innovations that radically transform metrology practices.
ARCNL’s unique expertise in integrating ML-based data processing with advanced optical metrology techniques brings significant value to the NXTGEN Hightech project. The approach not only enhances the performance of metrology tools but also introduces groundbreaking methods for non-contact measurement, setting new standards in the industry.
Through the NXTGEN Hightech Semicon04 project, ARCNL is poised to lead advancements in sensor technologies and data processing, contributing to the future of high-tech metrology and beyond.